Title :
Reliability of GaN-Based HEMT devices
Author :
Menozzi, Roberto
Author_Institution :
Dept. of Inf. Eng., Univ. of Parma, Parma
fDate :
July 28 2008-Aug. 1 2008
Abstract :
This paper reviews the main problems characterizing the past and present of GaN-based HEMT reliability. Some general considerations on the maturity of this technology and published lifetesting extrapolations are followed by a review of physical degradation mechanisms, subdivided between temperature-activated and electrical ones, the latter generally linked with the much-debated ldquocurrent collapserdquo. The paper ends with some conclusive remarks on what has been achieved and what still lies ahead.
Keywords :
III-V semiconductors; extrapolation; gallium compounds; high electron mobility transistors; life testing; semiconductor device reliability; wide band gap semiconductors; GaN; HEMT reliability; current collapse; electrical degradation; high electron mobility transistors; life testing extrapolations; physical degradation; temperature-activated degradation; Aluminum gallium nitride; Chemical technology; Degradation; Gallium nitride; Gold; HEMTs; History; Life testing; Stability; Temperature; HEMTs; gallium nitride; nitride devices; reliability;
Conference_Titel :
Optoelectronic and Microelectronic Materials and Devices, 2008. COMMAD 2008. Conference on
Conference_Location :
Sydney, SA
Print_ISBN :
978-1-4244-2716-1
Electronic_ISBN :
1097-2137
DOI :
10.1109/COMMAD.2008.4802089