• DocumentCode
    3000575
  • Title

    255 nm interconnected micro-pixel deep ultraviolet light emitting diodes

  • Author

    Khan, M. Asif ; Wu, Shuai ; Sun, Wenhong ; Chitnis, Ashay ; Adivarahan, Vinod ; Shatalov, Maxim ; Yang, Jinwei

  • Author_Institution
    Dept. of Electr. Eng., South Carolina Univ., Columbia, SC, USA
  • fYear
    2004
  • fDate
    13-15 Dec. 2004
  • Firstpage
    347
  • Lastpage
    350
  • Abstract
    We report on AlGaN based deep ultraviolet (UV) light emitting diodes (LED) with a micro-pixel design and emission at 255 nm. The micro-pixel design was adopted to improve the lateral current spreading and to reduce the operation voltages. For a 10×10 interconnected 25 μm diameter micro-pixel design the device series resistance as low as 17.5 Q was measured. For a packaged LED, output powers of 0.9 mW at 160 mA dc and 3.4 mW at 240 mA pulse pump currents were measured.
  • Keywords
    III-V semiconductors; aluminium compounds; gallium compounds; light emitting diodes; ultraviolet sources; wide band gap semiconductors; 255 nm; AlGaN; deep ultraviolet light emitting diodes; micro-pixel design; pulse pump currents; series resistance; Buffer layers; Capacitive sensors; Current measurement; Electrical resistance measurement; Fabrication; Light emitting diodes; Light sources; Power generation; Pulse measurements; Superlattices;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting, 2004. IEDM Technical Digest. IEEE International
  • Print_ISBN
    0-7803-8684-1
  • Type

    conf

  • DOI
    10.1109/IEDM.2004.1419153
  • Filename
    1419153