DocumentCode :
3003952
Title :
Self-consistent electro-thermo-mechanical analysis of AlN passivation effect on AlGaN/GaN HEMTs
Author :
Prabowo, Briliant Adhi ; Anumeha ; Prakash, Abijith ; Kumar, Raunak ; Sheu, Gene ; Tsai, Jung-Ruey ; Yang, Shao-Ming
Author_Institution :
Dept. of Comput. Sci. & Inf. Eng., Asia Univ., Taichung, Taiwan
fYear :
2011
fDate :
21-24 Nov. 2011
Firstpage :
1356
Lastpage :
1360
Abstract :
In this article, the effect of AlN materials as passivation over AlGaN layer on AlGaN/GaN HEMTs performance was investigated firstly using electro-thermo-mechanical coupled methodology by both TCAD simulation and analytic calculation. It suggested that AlN passivation layer over AlGaN layer effectively spread the surface heat from the channel resulting in reduction of the lattice temperature and enhances the mechanical properties. The drain current in the AlN-passivated device significantly increases about 30% higher than that in un passivated AlN layer device which is consistent with previous experimental data and demonstrates that the current collapse can be suppressed by dielectric AlN passivation process.
Keywords :
aluminium alloys; gallium alloys; high electron mobility transistors; passivation; A1N passivation effect; AlGaN; GaN; HEMT; TCAD simulation; mechanical properties; self-consistent electro-thermo-mechanical analysis; Aluminum gallium nitride; Gallium nitride; HEMTs; Lattices; MODFETs; Passivation; Stress; AlGaN/GaN; AlN passivation; HEMT; electro-thermo-mechanical; reliability;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
TENCON 2011 - 2011 IEEE Region 10 Conference
Conference_Location :
Bali
ISSN :
2159-3442
Print_ISBN :
978-1-4577-0256-3
Type :
conf
DOI :
10.1109/TENCON.2011.6129029
Filename :
6129029
Link To Document :
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