DocumentCode :
3008625
Title :
Diamond microstructure replicas from silicon masters
Author :
Björkman, H. ; Rangsten, P. ; Simu, U. ; Karlsson, J. ; Hollman, P. ; Hjort, K.
Author_Institution :
Dept. of Mater. Sci., Uppsala Univ., Sweden
fYear :
1998
fDate :
25-29 Jan 1998
Firstpage :
34
Lastpage :
39
Abstract :
We are developing a microstructure technology for thick film diamond replicas, using deposition by hot filament CVD on microstructured silicon. This technology is primarily intended to make micromechanical structures for building-sets, fluidic cooling systems, systems for biochemical analyses and processes, and moulds for thermoplastic microstructures. In the thick film deposition on trenches in silicon, complete filling was possible with an aspect ratio up to 1.6. At higher aspect ratios, voids or channels are formed within the diamond replica. Ridges, trenches and capillary channels with high resolution coverage and low roughness, rms<2 nm, were created. Demonstrator structures for microfluidic, building-sets and polymer moulding applications are presented
Keywords :
CVD coatings; chemical vapour deposition; diamond; etching; micromachining; micromechanical devices; replica techniques; C; Si; biochemical analysis systems; building-sets; capillary channels; diamond microstructure replicas; fluidic cooling systems; high aspect ratio; hot filament CVD; microfluidics; micromachining; micromechanical structures; moulds; ridges; sacrificial etching; silicon masters; thermoplastic microstructures; thick film diamond replicas; thinning; trenches; voids; Chemical vapor deposition; Conducting materials; Crystalline materials; Hydrogen; Materials science and technology; Micromechanical devices; Microstructure; Semiconductor materials; Silicon; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Micro Electro Mechanical Systems, 1998. MEMS 98. Proceedings., The Eleventh Annual International Workshop on
Conference_Location :
Heidelberg
ISSN :
1084-6999
Print_ISBN :
0-7803-4412-X
Type :
conf
DOI :
10.1109/MEMSYS.1998.659725
Filename :
659725
Link To Document :
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