Title :
Large-area Metal Grid Ultraviolet Filter Fabricated by Nanoimprint Lithography
Author :
Li, Wen-Di ; Chou, Stephen Y.
Author_Institution :
Princeton Univ., Princeton
Abstract :
For the first time, a wafer-scale metal grid UV filter is fabricated by nanoimprint lithography and demonstrates cut-off wavelength of 350 nm, peak transmission of 27% at 285 nm and rejection ratio of 20 dB at visible wavelength.
Keywords :
nanolithography; optical filters; large-area metal grid; nanoimprint lithography; ultraviolet filter; wafer-scale metal grid; wavelength 285 nm; Aluminum; Chromium; Costs; Detectors; Electron beams; Fabrication; Integrated optics; Lithography; Nanolithography; Optical filters;
Conference_Titel :
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location :
Baltimore, MD
Print_ISBN :
978-1-55752-834-6
DOI :
10.1109/CLEO.2007.4452830
