DocumentCode :
3009842
Title :
Laser chip separation method for GaAs MMIC wafers
Author :
Wong, E.H. ; Wylie, R.B. ; Johnson, D.R.
Author_Institution :
Hewlett-Packard Co., Santa Rosa, CA, USA
fYear :
1988
fDate :
24-25 May 1988
Firstpage :
113
Lastpage :
116
Abstract :
A chip separation process is described that uses a Nd-YAG laser with the wafer mounted on stretchable tape for machine sort and load for GaAs monolithic microwave integrated circuit (MMIC) wafers. This method is considered especially suitable for prototype masks with multiple-chip design. One of the major advantages of this technique is that the laser can be programmed to cut any pattern desired such that the different circuits need not be laid out in a straight grid pattern as required for sawing. One hundred percent (100%) chip separation yield with no chipping or cracking has been demonstrated. The complete laser chip-separation process consists of eight steps: front scribe alley etch, backside lopping, wafer test, wafer mounting, protective coating for optimal die separation, laser cutting, protective coat removal, and stretch and frame for sorting and chip loading. The process steps are described, and the method´s advantages are noted.<>
Keywords :
III-V semiconductors; gallium arsenide; integrated circuit technology; laser beam machining; microwave integrated circuits; monolithic integrated circuits; GaAs; MMIC wafers; Nd:YAG laser; YAG:Nd; YAl5O12:Nd; backside lopping; chip separation yield; front scribe alley etch; laser chip separation method; laser cutting; machine sort and load; multiple-chip design; optimal die separation; protective coat removal; protective coating; prototype masks; stretchable tape; wafer mounting; wafer test; Gallium arsenide; Laser beam cutting; MMICs; Masers; Microwave integrated circuits; Monolithic integrated circuits; Protection; Prototypes; Sawing; Separation processes;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Millimeter-Wave Monolithic Circuits Symposium, 1988. Digest of Papers., IEEE 1988
Conference_Location :
New York, NY, USA
Type :
conf
DOI :
10.1109/MCS.1988.197302
Filename :
197302
Link To Document :
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