• DocumentCode
    3014345
  • Title

    Design and evaluation of two MTJ-based content addressable non-volatile memory cells

  • Author

    Ke Chen ; Jie Han ; Lombardi, Floriana

  • Author_Institution
    ECE Dept., Northeastern Univ., Boston, MA, USA
  • fYear
    2013
  • fDate
    5-8 Aug. 2013
  • Firstpage
    707
  • Lastpage
    712
  • Abstract
    This paper proposes two non-volatile content addressable memory (CAM) cells using magnetic tunneling junction (MTJ) devices and nanoscaled CMOS transistors. The first novelty of the proposed non-volatile cells is that their operation and comparison outcome are voltage-based, hence requiring no current sensor. Two types of MTJ CAM cell are proposed; each of them utilizes two MTJs in a voltage divider arrangement. They differ in the number of required transistors, i.e. the first is a NOR type cell requiring six MOSFETs, while the second is a NAND type cell requiring five MOSFETs. Performance metrics (as related to search delay, power dissipation and static noise margin) as well as variation to process, voltage and temperature (PVT) are assessed by simulation at different feature sizes of the MOSFETs. The simulation results show that the proposed designs significantly improve in terms of search delay and power delay product (PDP) over existing non-volatile CAM memory cells utilizing MTJs.
  • Keywords
    CMOS memory circuits; MRAM devices; NAND circuits; NOR circuits; content-addressable storage; magnetic tunnelling; voltage dividers; MOSFET; MTJ devices; NAND type cell; NOR type cell; PDP; PVT; magnetic tunneling junction devices; nanoscaled CMOS transistors; nonvolatile CAM cells; nonvolatile content addressable memory cells; power delay product; process voltage and temperature; search delay; voltage divider arrangement; Computer aided manufacturing; Delays; Integrated circuits; Magnetic tunneling; Nonvolatile memory; Resistance; Transistors;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
  • Conference_Location
    Beijing
  • ISSN
    1944-9399
  • Print_ISBN
    978-1-4799-0675-8
  • Type

    conf

  • DOI
    10.1109/NANO.2013.6720805
  • Filename
    6720805