Title :
The investigation of surface roughness of substrate on electrochromic characteristics for PMeT thin film
Author :
Cheng-Jung Yang ; Jung-Chuan Chou ; Yi-Hung Liao ; Chia-Yu Liu ; Pei-An Ho ; Chien-Jung Huang ; Hsueh-Tao Chou
Author_Institution :
Dept. of Electron. Eng., Nat. Yunlin Univ. of Sci. & Technol., Douliou, Taiwan
Abstract :
The objective of this study is to investigate the influence of surface roughness on electrochromic characteristics. The rough surface of indium tin oxide/glass (ITO/Glass) was prepared by wet etching. And the poly (3-methylthiophene) (PMeT) has been deposited on ITO/Glass by potentiostatic method. The electrochromic behaviors of the PMeT/ITO/Glass were performed in 0.1 M lithium perchlorate (LiClO4)/propylene carbonate (PC) electrolyte. Compared with the oxalic acid ((COOH)2·H2O) and ferric chloride + hydrochloric acid (FeCl3+HCl) solutions, the ITO/Glass has high surface roughness when the ITO/Glass was etched in (COOH)2·H2O solution. The PMeT/ITO/Glass has the best transmittance variation (ΔT(%)) (25 %) at 450 nm after the ITO/Glass was etched in (COOH)2·H2O solution for 160 sec. And, the PMeT/ITO/Glass has the best transmittance variation (ΔT(%)) (5 %) at 650 nm after the ITO/Glass was etched in FeCl3+HCl solution for 60 sec. Furthermore, the experimental results observed that the color of PMeT/ITO/Glass was changed from blue (oxidation state) to red (reduction state).
Keywords :
electrochromism; etching; light transmission; oxidation; polymer films; reduction (chemical); surface roughness; ITO-SiO2; electrochromic properties; ferric chloride; hydrochloric acid; indium tin oxide-glass; lithium perchlorate-propylene carbonate electrolyte; oxalic acid; oxidation state; poly(3-methylthiophene) thin films; potentiostatic method; reduction state; surface roughness; time 160 s; time 60 s; transmittance; wavelength 450 nm; wet etching; Educational institutions; Electrodes; Glass; Indium tin oxide; Plastics; Rough surfaces; Surface treatment;
Conference_Titel :
Nanotechnology (IEEE-NANO), 2013 13th IEEE Conference on
Conference_Location :
Beijing
Print_ISBN :
978-1-4799-0675-8
DOI :
10.1109/NANO.2013.6720844
