Title :
Nanoscale Atomic Lithography With A Cesium Atomic Beam
Author :
Lison, F. ; Haubrich, D. ; Meschede, D.
Author_Institution :
Institute for Applied Physics
Keywords :
Atom optics; Atomic beams; Atomic layer deposition; Gold; Lithography; Optical films; Optical interferometry; Physics; Production; Self-assembly;
Conference_Titel :
Quantum Electronics Conference, 1998. 1998 EQEC. European
Conference_Location :
Glasgow, UK
Print_ISBN :
0-7803-4231-3
DOI :
10.1109/EQEC.1998.714730
