• DocumentCode
    3016445
  • Title

    Penning ionization of cesium by photoexcited mercury as a volumetric source of high-density plasma

  • Author

    Stalder, K.R. ; Vidmar, R.J.

  • Author_Institution
    SRI Int., USA
  • fYear
    1996
  • fDate
    3-5 June 1996
  • Firstpage
    221
  • Abstract
    Summary form only given. The efficient ionization of large volumes of gas leads to many applications that include materials processing, toxic gas remediation, MHD energy production, and others that affect military systems. We are studying efficient ways to develop high density plasmas and have identified Penning ionization as a potentially useful mechanism. In particular, the Penning ionization of cesium by metastable mercury appears to be very promising because of the favorable energetics of producing metastable mercury atoms that have electronic energies lying above the ionization potential of cesium. We are modeling the kinetics of the system, including the effects of buffer gases and molecular quenching gases. The reactions are used as input to a zero-dimensional chemical kinetics code, OLCHEM, which has been developed over the years to model a variety of chemical systems. This code integrates in time the kinetic equations and runs until steady state is achieved. The densities of all species, including specific excited-state atoms, molecules and photons that are treated as separate species, are plotted versus time.
  • Keywords
    caesium; Cs; Cs-Hg; Hg; MHD energy production; OLCHEM; Penning ionization; electronic energies; high-density plasma; kinetic equations; kinetics modeling; materials processing; metastable Hg; military systems; molecular quenching gases; photoexcited Hg; toxic gas remediation; volumetric source; zero-dimensional chemical kinetics code; Chemicals; Gases; Ionization; Kinetic theory; Magnetohydrodynamics; Materials processing; Metastasis; Plasma applications; Plasma density; Production systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
  • Conference_Location
    Boston, MA, USA
  • ISSN
    0730-9244
  • Print_ISBN
    0-7803-3322-5
  • Type

    conf

  • DOI
    10.1109/PLASMA.1996.550940
  • Filename
    550940