DocumentCode
3027367
Title
Practical Anti-Microbial Surfaces on Nylon and Polyester by UV Photochemistry
Author
Kelley, Michael J. ; Zhu, Zhengmao
Author_Institution
Jefferson Lab & Coll. of William & Mary, Newport News
fYear
2007
fDate
6-11 May 2007
Firstpage
1
Lastpage
1
Abstract
Surface radicals generated by 193 nm (nylon) or 172 nm (PET) UV light afford strongly antimicrobial amine functionality by grafting or by transformation. They are broadly effective in the lab and significantly viable in the field.
Keywords
free radicals; microorganisms; molecular biophysics; photochemistry; polymers; UV light; UV photochemistry; anti-microbial surfaces; antimicrobial amine functionality; grafting; nylon; polyester; surface radicals; wavelength 172 nm; wavelength 193 nm; Chemistry; Costs; Educational institutions; Influenza; Lead; Microwave integrated circuits; Nitrogen; Photochemistry; Polymers; Positron emission tomography;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2007. CLEO 2007. Conference on
Conference_Location
Baltimore, MD
Print_ISBN
978-1-55752-834-6
Type
conf
DOI
10.1109/CLEO.2007.4453755
Filename
4453755
Link To Document