Title :
High resolution photo-patterning on large area substrates
Author :
Müller, Heinrich G. ; Sheets, Ronald E.
Author_Institution :
Tamarack Sci., Armando St. CA, USA
Abstract :
A new type of photolithography system is presented. The method of scanning projection exposure is a cost effective way to pattern large area substrates with sufficient resolution for MCMs, super fine line PCBs, or thin film displays. The substrate is patterned with an erected 1:1 projection image of the mask. The exposure is performed on a small exposure field only. Scanning substrate and mask together below the exposure field results in a high resolution exposure of the entire substrate without need for the stitching operations of a step-and-repeat system, and without the mask deterioration problems of contact/proximity exposure
Keywords :
focusing; integrated circuit technology; multichip modules; photolithography; printed circuit manufacture; thin film circuits; MCMs; high resolution photo-patterning; large area substrates; mask; photolithography system; scanning projection exposure; super fine line PCBs; thin film displays; Costs; Displays; Lithography; Optical collimators; Optical distortion; Optical interferometry; Printing; Stray light; Substrates; Transistors;
Conference_Titel :
Electronics Manufacturing Technology Symposium, 1994. Low-Cost Manufacturing Technologies for Tomorrow's Global Economy. Proceedings 1994 IEMT Symposium., Sixteenth IEEE/CPMT International
Conference_Location :
La Jolla, CA
Print_ISBN :
0-7803-2037-9
DOI :
10.1109/IEMT.1994.404667
