DocumentCode :
3033736
Title :
Reliability and ultra-low temperature bonding of high density large area arrays with Cu/Sn-Cu interconnects for 3D integration
Author :
Reed, Jason D. ; Lueck, Matthew ; Gregory, Chris ; Huffman, Charles A. ; Lannon, John M., Jr. ; Temple, Dorota
Author_Institution :
Center for Mater. & Electron. Technol., RTI Int., Research Triangle Park, NC, USA
fYear :
2010
fDate :
6-9 June 2010
Firstpage :
1
Lastpage :
3
Abstract :
The results of lifetime testing of Cu/Sn-Cu eutectic bonded dice at 10μm pitch in large area arrays of 325,632 interconnects are shown. The interconnect bonding process (pressure and temperature) required for the formation of low resistance (~100 mΩ), high yielding (99.99% individual bond yield), and reliable interconnects is described. The effects of thermal cycling on electrical yield and resistance are presented. Ultra-low temperature eutectic bonding (at 210°C, below the melting point of tin) is demonstrated to produce high electrical yield, high shear strength and similar intermetallic compound formation to devices bonded at the standard 300°C temperature. Electrical results, shear test results, SEM cross sections and EDS analysis comparisons are presented. The ultralow temperature process may prove useful for integrating IC dice that have low thermal budgets.
Keywords :
electric resistance; eutectic alloys; integrated circuit bonding; integrated circuit interconnections; integrated circuit reliability; integrated circuit testing; integrated circuit yield; life testing; shear strength; Cu-SnCu; EDS analysis comparisons; SEM cross sections; electrical resistance; electrical yield; eutectic bonded dice; high density large area arrays; integrating IC dice; interconnect bonding process; intermetallic compound formation; lifetime testing; reliable interconnects; shear strength; shear test; size 10 mum; thermal cycling; ultra-low temperature bonding; ultra-low temperature eutectic bonding; Bonding processes; Electric resistance; Electric variables measurement; Etching; Fabrication; Temperature; Testing; Thermal resistance; Tin; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Interconnect Technology Conference (IITC), 2010 International
Conference_Location :
Burlingame, CA
Print_ISBN :
978-1-4244-7676-3
Type :
conf
DOI :
10.1109/IITC.2010.5510457
Filename :
5510457
Link To Document :
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