• DocumentCode
    3035657
  • Title

    A low power phase change memory using thermally confined TaN/TiN bottom electrode

  • Author

    Wu, J.Y. ; Breitwisch, M. ; Kim, S. ; Hsu, T.H. ; Cheek, R. ; Du, P.Y. ; Li, J. ; Lai, E.K. ; Zhu, Y. ; Wang, T.Y. ; Cheng, H.Y. ; Schrott, A. ; Joseph, E.A. ; Dasaka, R. ; Raoux, S. ; Lee, M.H. ; Lung, H.L. ; Lam, C.

  • Author_Institution
    IBM/Macronix PCRAM Joint Project, Macronix Int. Co. Ltd., Hsinchu, Taiwan
  • fYear
    2011
  • fDate
    5-7 Dec. 2011
  • Abstract
    Application of phase change memory (PCM) has been limited by the high power required to reset the device (changing from crystalline to amorphous state by melting the phase change material). Utilizing the poor thermal and electrical conductivity of TaN we have designed a simple structure that thermally insulates the bottom electrode and thus drastically reduces the heat loss. A 39nm bottom electrode with a TaN thermal barrier and 1.5nm of TiN conductor has demonstrated 30μA reset current, representing a 90% reduction. The benefit of thermal insulation is understood through electrothermal simulation, and the benefit is demonstrated in a 256Mb test chip. The low reset current also improves the reliability and excellent cycling endurance >;1E9 is observed. This low power device is promising for expanding the application for PCM.
  • Keywords
    conductors (electric); electrodes; heat losses; integrated circuit reliability; low-power electronics; phase change memories; tantalum compounds; thermal insulation; titanium compounds; TaN-TiN; current 30 muA; electrical conductivity; electrothermal simulation; low power PCM; low power phase change memory; size 1.5 nm; size 39 nm; storage capacity 256 Mbit; thermal barrier; thermal insulation; thermally confined bottom electrode; Electrodes; Heating; Phase change memory; Solids; Thermal resistance; Tin;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electron Devices Meeting (IEDM), 2011 IEEE International
  • Conference_Location
    Washington, DC
  • ISSN
    0163-1918
  • Print_ISBN
    978-1-4577-0506-9
  • Electronic_ISBN
    0163-1918
  • Type

    conf

  • DOI
    10.1109/IEDM.2011.6131479
  • Filename
    6131479