Title :
Electron beam patterning on permeable polymer membranes for nanolithography and microfluidic applications
Author :
Schaper, C. ; Tay, A.
Author_Institution :
Inf. Syst. Lab., Stanford Univ., CA, USA
Abstract :
Initial results are described on using lithographic techniques to pattern permeable polymer membranes using electron beam and optical techniques. The patterned membranes have a spatially selective permeability to electrolytes or to vapor phase reactants. Applications for the membranes include a non-optical method for patterning and for microfluidic applications. Two methods are demonstrated for fabricating the permeable membranes including patterning directly on the surface and on a sputtered metal coating
Keywords :
electron beam lithography; masks; membranes; microfluidics; nanotechnology; polymer films; electrolytes; electron beam patterning; lithographic tool; mask fabrication method; microfluidic applications; nanolithography applications; nonoptical patterning method; permeable polymer membranes; spatially selective permeability; sputtered metal coating; vapor phase reactants; Aluminum; Biomembranes; Chemicals; Coatings; Electron beams; Etching; Lithography; Microfluidics; Nanolithography; Optical polymers;
Conference_Titel :
University/Government/Industry Microelectronics Symposium, 1999. Proceedings of the Thirteenth Biennial
Conference_Location :
Minneapolis, MN
Print_ISBN :
0-7803-5240-8
DOI :
10.1109/UGIM.1999.782829