DocumentCode :
3041800
Title :
A non-destructive method for in-line glass flow control
Author :
Tissier, A. ; Poncet, A. ; Giroult, G. ; Maystre, D. ; Vincent, P.
Author_Institution :
CNET-CNS, Meylan, France
fYear :
1988
fDate :
13-14 June 1988
Firstpage :
374
Lastpage :
381
Abstract :
The authors have studied the problem of reflow profile control using laser beam diffraction by a line grating which forms a test pattern. Both the glass reflow and the diffracted light pattern have been modeled and computer simulations have been performed. The theoretical and experimental results were found to show that good correlation can be obtained between the diffraction pattern and the flow stage. These results lead to a new nondestructive inline glass flow control method. The results obtained are considered pertinent to the multilevel interconnection CMOS process.<>
Keywords :
CMOS integrated circuits; borosilicate glasses; flow control; integrated circuit technology; laser beam applications; metallisation; phosphosilicate glasses; B2O3-P2O5-SiO2; BPSG; computer simulations; diffraction pattern; in-line glass flow control; laser beam diffraction; line grating; multilevel interconnection CMOS process; nondestructive method; reflow profile control; test pattern; CMOS process; Computer simulation; Diffraction gratings; Glass; Laser beams; Laser modes; Laser theory; Optical control; Semiconductor device modeling; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Multilevel Interconnection Conference, 1988. Proceedings., Fifth International IEEE
Conference_Location :
Santa Clara, CA, USA
Type :
conf
DOI :
10.1109/VMIC.1988.14215
Filename :
14215
Link To Document :
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