• DocumentCode
    3045223
  • Title

    The Effects of Thermal Oxidation of a MEMS Resonator on Temperature Drift and Absolute Frequency

  • Author

    van der Avoort, C. ; van Wingerden, J. ; van Beek, J.T.M.

  • Author_Institution
    NXP Semicond. Res., Eindhoven
  • fYear
    2009
  • fDate
    25-29 Jan. 2009
  • Firstpage
    654
  • Lastpage
    656
  • Abstract
    The dependency of the resonance frequency on temperature, in short temperature drift, of Si resonators is the major contributor to frequency inaccuracy of MEMS based oscillators. The temperature dependency can be reduced through thermal oxidation of the resonator (Melamud et al., 2007). However, in this paper it is concluded that thickness control of the oxidation layer has a major influence on the absolute frequency, besides on the temperature drift, and as such dominates the frequency spread of a MEMS resonator after production including oxidation. This is a result of the large difference in Young´s modulus of Si and SiO2 and the added mass due to oxidation. The overall frequency range in operation - including both thermal drift range and spread in absolute frequency - can even deteriorate, rather than improve, through thermal oxidation, depending on the accuracy at which the oxide thickness is controlled.
  • Keywords
    micromechanical resonators; oscillators; oxidation; oxygen compounds; silicon compounds; MEMS based oscillators; MEMS resonator; SiO2; Young modulus; on temperature drift and absolute frequency; resonance frequency; thermal oxidation; Micromechanical devices; Optical resonators; Oscillators; Oxidation; Resonance; Resonant frequency; Silicon; Temperature dependence; Thickness control; Vibration measurement;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
  • Conference_Location
    Sorrento
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-2977-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2009.4805467
  • Filename
    4805467