DocumentCode
3045223
Title
The Effects of Thermal Oxidation of a MEMS Resonator on Temperature Drift and Absolute Frequency
Author
van der Avoort, C. ; van Wingerden, J. ; van Beek, J.T.M.
Author_Institution
NXP Semicond. Res., Eindhoven
fYear
2009
fDate
25-29 Jan. 2009
Firstpage
654
Lastpage
656
Abstract
The dependency of the resonance frequency on temperature, in short temperature drift, of Si resonators is the major contributor to frequency inaccuracy of MEMS based oscillators. The temperature dependency can be reduced through thermal oxidation of the resonator (Melamud et al., 2007). However, in this paper it is concluded that thickness control of the oxidation layer has a major influence on the absolute frequency, besides on the temperature drift, and as such dominates the frequency spread of a MEMS resonator after production including oxidation. This is a result of the large difference in Young´s modulus of Si and SiO2 and the added mass due to oxidation. The overall frequency range in operation - including both thermal drift range and spread in absolute frequency - can even deteriorate, rather than improve, through thermal oxidation, depending on the accuracy at which the oxide thickness is controlled.
Keywords
micromechanical resonators; oscillators; oxidation; oxygen compounds; silicon compounds; MEMS based oscillators; MEMS resonator; SiO2; Young modulus; on temperature drift and absolute frequency; resonance frequency; thermal oxidation; Micromechanical devices; Optical resonators; Oscillators; Oxidation; Resonance; Resonant frequency; Silicon; Temperature dependence; Thickness control; Vibration measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
Conference_Location
Sorrento
ISSN
1084-6999
Print_ISBN
978-1-4244-2977-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2009.4805467
Filename
4805467
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