DocumentCode
3045298
Title
Low Temperature Fabrication Process for High-Aspect-Ratio and Multi-Compliant MEMS
Author
Kühne, S. ; Blattmann, R. ; Hierold, Ch
Author_Institution
Dept. of Mech. & Process Eng., ETH Zurich, Zurich
fYear
2009
fDate
25-29 Jan. 2009
Firstpage
673
Lastpage
676
Abstract
The presented process technology enables the fabrication of 3D high-aspect-ratio microstructures featuring the integration of multiple materials. The technology offers the possibility to benefit from unique material properties for optimized MEMS functionality and performance. The fabrication process relies on wafer stacking by low temperature plasma activated direct bonding, SOI layer transfer and SU-8 structuring. The proposed process flow is validated by the fabrication of micro mirrors featuring a soft polymeric suspension and a high-aspect-ratio vertical comb-drive actuator. The devices are characterized and confirm the expected performance with dynamic resonant optical deflection angles of 59deg at 50V.
Keywords
micromechanical devices; micromirrors; wafer bonding; MEMS functionality; MEMS performance; SOI layer transfer; SU-8 structuring; high-aspect-ratio MEMS; low temperature fabrication; low temperature plasma activated direct bonding; material property; micromirror; microstructure; multicompliant MEMS; soft polymeric suspension; wafer stacking; Fabrication; Material properties; Micromechanical devices; Microstructure; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Stacking; Wafer bonding;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
Conference_Location
Sorrento
ISSN
1084-6999
Print_ISBN
978-1-4244-2977-6
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2009.4805472
Filename
4805472
Link To Document