• DocumentCode
    3045298
  • Title

    Low Temperature Fabrication Process for High-Aspect-Ratio and Multi-Compliant MEMS

  • Author

    Kühne, S. ; Blattmann, R. ; Hierold, Ch

  • Author_Institution
    Dept. of Mech. & Process Eng., ETH Zurich, Zurich
  • fYear
    2009
  • fDate
    25-29 Jan. 2009
  • Firstpage
    673
  • Lastpage
    676
  • Abstract
    The presented process technology enables the fabrication of 3D high-aspect-ratio microstructures featuring the integration of multiple materials. The technology offers the possibility to benefit from unique material properties for optimized MEMS functionality and performance. The fabrication process relies on wafer stacking by low temperature plasma activated direct bonding, SOI layer transfer and SU-8 structuring. The proposed process flow is validated by the fabrication of micro mirrors featuring a soft polymeric suspension and a high-aspect-ratio vertical comb-drive actuator. The devices are characterized and confirm the expected performance with dynamic resonant optical deflection angles of 59deg at 50V.
  • Keywords
    micromechanical devices; micromirrors; wafer bonding; MEMS functionality; MEMS performance; SOI layer transfer; SU-8 structuring; high-aspect-ratio MEMS; low temperature fabrication; low temperature plasma activated direct bonding; material property; micromirror; microstructure; multicompliant MEMS; soft polymeric suspension; wafer stacking; Fabrication; Material properties; Micromechanical devices; Microstructure; Plasma devices; Plasma materials processing; Plasma properties; Plasma temperature; Stacking; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2009. MEMS 2009. IEEE 22nd International Conference on
  • Conference_Location
    Sorrento
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-2977-6
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2009.4805472
  • Filename
    4805472