Title :
Characterization of multi-domain bumps of organic resists in color filters for wide-viewing-angle liquid crystal displays
Author :
Yang, Sheng-Hung ; Koo, Homg- Show ; Kawai, Tomoji
Author_Institution :
Minghsin Univ. of Sci. & Technol., Hsinchu
Abstract :
The negative-type multi-domain vertical alignment(MVA) photoresist have been significantly synthesized and potentially integrated in the processing of color filter for the application of wide-viewing-angle liquid crystal display. The expectable results including excellent light transmittance, stability and uniformity of protrusion bumps in shape, superior reliability in material characteristics and wider gamut have significantly been achieved. The brightness of negative-type photoresist(NPR) is superior to that of positive-type photoresist(PPR) as a result of NPR owing excellent transmittance. The transmittance of protrusions of positive-type photo resist and negative-type photo resist is 70 % and 100%, respectively.
Keywords :
brightness; liquid crystal displays; optical filters; photoresists; brightness; color filters; light transmittance; multidomain bumps; negative-type multidomain vertical alignment photoresist; negative-type photoresist; organic resists; positive-type photoresist; protrusion bumps; wide-viewing-angle liquid crystal displays; Color; Crystalline materials; Liquid crystal displays; Materials reliability; Nanotechnology; Optical filters; Optical materials; Resists; Shape; Stability; Photoresit; color filter; multi-domain vertical alignment; protrusion; wide view angle;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456122
