• DocumentCode
    3050573
  • Title

    EUV lithography using the small field exposure tool: recent status

  • Author

    Tawarayama, Kazuo ; Magoshi, Shunko ; Tanaka, Yuusuke ; Shirai, Seiichiro ; Tanaka, Hiroyuki

  • Author_Institution
    Semiconductor Leading Edge Technol. Inc., Ibaraki
  • fYear
    2007
  • fDate
    5-8 Nov. 2007
  • Firstpage
    398
  • Lastpage
    399
  • Abstract
    The tool performance of the SFET was effectively demonstrated with the resolution of 45-nm, 32-nm and 26-nm half-pitch lines and spaces patterns. These initial results will provide the basis for the continuous and fast-paced development of EUV lithography in Selete.
  • Keywords
    ultraviolet lithography; EUV lithography; Selete´s small field exposure tool; semiconductor design; Chemicals; Lead compounds; Lighting; Lithography; Manufacturing; Plasma materials processing; Plasma sources; Resists; Stimulated emission; Ultraviolet sources;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microprocesses and Nanotechnology, 2007 Digest of papers
  • Conference_Location
    Kyoto
  • Print_ISBN
    978-4-9902472-4-9
  • Type

    conf

  • DOI
    10.1109/IMNC.2007.4456272
  • Filename
    4456272
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3050573