Title :
Realization and simulation of high aspect ratio micro/nano structures by proton beam writing
Author :
Chatzichristidi, M. ; Valamontes, E. ; Raptis, I. ; van Kan, J.A. ; Watt, F.
Author_Institution :
NCSR "Demokritos", Athens
Abstract :
In this paper, proton beam writing is combined with an aqueous developable-easily stripped negative chemically amplified resist (TADEP: thick aqueous developable epoxy resist) for the realization of high aspect ratio structures. Monte Carlo method is used to simulate PBW in thick resist films. Result shows that resist structures with 280 nm linewidth and aspect ratio of 40 were easily resolved.
Keywords :
Monte Carlo methods; nanotechnology; polymer films; polymers; proton effects; resists; Monte Carlo method; epoxy polymer; epoxy resist; proton beam writing; resist films; size 280 nm; Chemicals; Fabrication; Ion beam applications; Microelectronics; Particle beams; Physics; Protons; Resists; Testing; Writing;
Conference_Titel :
Microprocesses and Nanotechnology, 2007 Digest of papers
Conference_Location :
Kyoto
Print_ISBN :
978-4-9902472-4-9
DOI :
10.1109/IMNC.2007.4456283
