Title :
The technology and applications of selective oxidation of AlGaAs
Author :
Choquette, Kent D. ; Geib, K.M. ; Hou, H.Q. ; Mathes, D. ; Hull, Robert
Author_Institution :
Center for Compound Semicond. Sci. & Technol., Sandia Nat. Labs., Albuquerque, NM, USA
Abstract :
Wet oxidation of AlGaAs alloys, pioneered at the University of Illinois a decade ago, recently has been used to fabricate high performance vertical-cavity surface emitting lasers (VCSELs). The superior properties of oxide-confined VCSELs has stimulated interest in understanding the fundamentals of wet oxidation. We briefly review the technology of selective oxidation of III-V alloys, including the oxide microstructure and oxidation processing as well as describe its application to selectively oxidized VCSELs
Keywords :
III-V semiconductors; aluminium compounds; crystal microstructure; gallium arsenide; optical fabrication; oxidation; reviews; surface emitting lasers; AlGaAs; III-V alloys; SiC; VCSELs; high performance vertical-cavity surface emitting lasers; oxidation processing; oxide microstructure; oxide-confined VCSELs; review; selective oxidation; selectively oxidized VCSELs; wet oxidation; Amorphous materials; Microstructure; Optical surface waves; Oxidation; Robustness; Semiconductor lasers; Surface emitting lasers; Temperature; Vertical cavity surface emitting lasers; Waveguide lasers;
Conference_Titel :
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-4354-9
DOI :
10.1109/SIM.1998.785109
