Title :
Fabrication of a filter-type WDM on a silica-based planar lightwave circuit
Author :
Ueki, K. ; Tamura, S. ; Watanabe, K. ; Ozawa, S.
Author_Institution :
Opto-Technol. Lab., Furukawa Electr. Co. Ltd., Chiba, Japan
Abstract :
A filter-type WDM on a silica-based PLC is discussed from the view point of filter alignment tolerance in relation to Δ of the waveguide. The significance of the angular filter placement error is clarified - it appeared to be the dominant loss factor for the 1.55 μm port
Keywords :
multiplexing equipment; optical fabrication; optical losses; optical planar waveguides; optical waveguide components; optical waveguide filters; silicon compounds; wavelength division multiplexing; 1.55 μm port; 1.55 mum; SiO2; angular filter placement error; dominant loss factor; fabrication; filter alignment tolerance; filter-type WDM; silica-based planar lightwave circuit; Band pass filters; Circuits; Matched filters; Optical device fabrication; Optical propagation; Programmable control; Propagation losses; Silicon compounds; Waveguide discontinuities; Wavelength division multiplexing;
Conference_Titel :
Lasers and Electro-Optics Society Annual Meeting, 1996. LEOS 96., IEEE
Conference_Location :
Boston, MA
Print_ISBN :
0-7803-3160-5
DOI :
10.1109/LEOS.1996.565241
