DocumentCode :
3053242
Title :
Analysis of substrate deep-trap effects on the turn-on characteristics in GaAs MESFETs
Author :
Horio, K. ; Wakabayashi, A. ; Otsuka, S. ; Yamada, T.
Author_Institution :
Fac. of Syst. Eng., Shibaura Inst. of Technol., Tokyo, Japan
fYear :
1998
fDate :
1998
Firstpage :
327
Lastpage :
330
Abstract :
Two-dimensional analysis of the turn-on characteristics of GaAs MESFETs is made in which deep donors “EL2” in the semi-insulating substrate and surface states are considered. It is found that abnormal current overshoot due to EL2 can be seen when the off-state gate voltage is deeply negative. This is because in such a case electrons are depleted also in the semi-insulating substrate in the OFF state, and the corresponding ionized EL2 density NEL2+ around the channel-substrate interface can be much higher than in the ON state
Keywords :
III-V semiconductors; Schottky gate field effect transistors; deep levels; electron traps; gallium arsenide; hole traps; impurity states; semiconductor device models; substrates; surface states; GaAs; GaAs MESFETs; abnormal current overshoot; channel-substrate interface; deep donors; ionized EL2 density; off-state gate voltage; semi-insulating substrate; substrate deep-trap effects; surface states; turn-on characteristics; two-dimensional analysis; Charge carrier processes; Electrons; Energy states; Gallium arsenide; Insulation; MESFETs; Modeling; Poisson equations; Systems engineering and theory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconducting and Insulating Materials, 1998. (SIMC-X) Proceedings of the 10th Conference on
Conference_Location :
Berkeley, CA
Print_ISBN :
0-7803-4354-9
Type :
conf
DOI :
10.1109/SIM.1998.785136
Filename :
785136
Link To Document :
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