Title :
Designing bulk-driven MOSFETs in scaled technologies
Author :
Urban, Christopher ; Moon, James E. ; Mukund, P.R.
Author_Institution :
Dept. of Electr. Eng., Rochester Inst. of Technol., Rochester, NY, USA
Abstract :
This paper has presented simulation results which show that delta doping is capable of significantly improving gmb (and thus, the intrinsic gain) in a BD MOSFET for channel lengths common to modern processes. Results also showed that the oxide thickness typically required for GD operation can be relaxed in a BD MOSFET; QM effects were then shown to degrade gmb less aggressively than gm.
Keywords :
MOSFET; semiconductor device models; bulk-driven MOSFET design; delta doping; scaled technologies; Circuit simulation; Degradation; Doping; Educational institutions; Low voltage; MOSFETs; Moon; Semiconductor process modeling; System-on-a-chip; Threshold voltage;
Conference_Titel :
Semiconductor Device Research Symposium, 2009. ISDRS '09. International
Conference_Location :
College Park, MD
Print_ISBN :
978-1-4244-6030-4
Electronic_ISBN :
978-1-4244-6031-1
DOI :
10.1109/ISDRS.2009.5378256