Title :
The recent TEM application development for microelectronics
Author :
Sheng, Tan Tsu ; Tung, Chih Hang ; Wang, John
Author_Institution :
Inst. of Microelectron., Singapore
Abstract :
Transmission electron microscopy (TEM) has played an important role in silicon VLSI/ULSI process evaluation and failure analysis. More recently, it has also been applied to micro-electro-machine system (MEMS), MCM, ...etc. In this talk, a few recent TEM application developments are presented. Some of these TEM applications may seem very difficult or impossible previously. These new applications are made possible by innovative sample preparation break through
Keywords :
failure analysis; integrated circuit testing; specimen preparation; transmission electron microscopy; TEM application; failure analysis; micro-electro-machine system; microelectronics; process evaluation; transmission electron microscopy; Accelerometers; Biomembranes; Electron beams; Isolation technology; Microelectronics; Micromechanical devices; Oxidation; Silicon; Transmission electron microscopy; Very large scale integration;
Conference_Titel :
Solid-State and Integrated Circuit Technology, 1998. Proceedings. 1998 5th International Conference on
Conference_Location :
Beijing
Print_ISBN :
0-7803-4306-9
DOI :
10.1109/ICSICT.1998.785884
