Title :
A compact dual-wavelength optical head for photo-lithography
Author :
Yuan-Chin Lee ; Shiuh Chao ; Chun-Chieh Huang ; Shuen-Chen Chen ; Chung-Ta Cheng
Author_Institution :
Electron. & Optoelectron. Res. Labs., Ind. Technol. Res. Inst., Hsinchu, Taiwan
fDate :
June 30 2013-July 4 2013
Abstract :
A dual-wavelength optical head with an NA0.85 objective lens for lithography was developed. Both 405nm and 650nm are integrated in this optical head. It can be used to expose both organic and in-organic photo-resists and meanwhile performing focusing servo.
Keywords :
lenses; photoresists; NA0.85 objective lens; compact dual-wavelength optical head; focusing servo; inorganic photoresists; photolithography; wavelength 405 nm; wavelength 650 nm; Adaptive optics; Lenses; Optical design; Optical diffraction; Optical imaging; Optical sensors; Servomotors;
Conference_Titel :
Lasers and Electro-Optics Pacific Rim (CLEO-PR), 2013 Conference on
Conference_Location :
Kyoto
DOI :
10.1109/CLEOPR.2013.6600565
