• DocumentCode
    3068968
  • Title

    Inductance on silicon for sub-micron CMOS VLSI

  • Author

    Priore, D.A.

  • Author_Institution
    Digital Equipment Corp., Hudson, MA, USA
  • fYear
    1993
  • fDate
    19-21 May 1993
  • Firstpage
    17
  • Lastpage
    18
  • Abstract
    It has long been customary for silicon-based IC designers to restrict their attention to resistive and capacitive effects when considering circuits confined to the chip. The simple justification for this approach has been that typical "RC" time constants in this environment dwarf the "time of flight" of light across the distances involved. However, with the advent of large chips running at upwards of 100MHz, this assumption is called into question. Furthermore, due to the lossy nature of the silicon environment, the "time of flight" in question does not follow simply from the delay rate of light in silicon dioxide (i.e. 66ps/cm). In general, it is greater. This paper attempts to frame the problem and suggest design principles to deal with it. These principles have been used extensively in the design of a 200MHz 64-bit dual-issue CMOS microprocessor.
  • Keywords
    CMOS integrated circuits; VLSI; elemental semiconductors; inductance; microprocessor chips; silicon; 100 to 200 MHz; design principles; dual-issue CMOS microprocessor; inductance effects; silicon-based IC design; sub-micron CMOS VLSI; CMOS integrated circuits; Inductance calculations; Integrated circuit design; Microprocessors; Silicon materials/devices; Very-large-scale integration;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    VLSI Circuits, 1993. Digest of Technical Papers. 1993 Symposium on
  • Conference_Location
    Kyoto, Japan
  • Type

    conf

  • DOI
    10.1109/VLSIC.1993.920518
  • Filename
    920518