DocumentCode
3068968
Title
Inductance on silicon for sub-micron CMOS VLSI
Author
Priore, D.A.
Author_Institution
Digital Equipment Corp., Hudson, MA, USA
fYear
1993
fDate
19-21 May 1993
Firstpage
17
Lastpage
18
Abstract
It has long been customary for silicon-based IC designers to restrict their attention to resistive and capacitive effects when considering circuits confined to the chip. The simple justification for this approach has been that typical "RC" time constants in this environment dwarf the "time of flight" of light across the distances involved. However, with the advent of large chips running at upwards of 100MHz, this assumption is called into question. Furthermore, due to the lossy nature of the silicon environment, the "time of flight" in question does not follow simply from the delay rate of light in silicon dioxide (i.e. 66ps/cm). In general, it is greater. This paper attempts to frame the problem and suggest design principles to deal with it. These principles have been used extensively in the design of a 200MHz 64-bit dual-issue CMOS microprocessor.
Keywords
CMOS integrated circuits; VLSI; elemental semiconductors; inductance; microprocessor chips; silicon; 100 to 200 MHz; design principles; dual-issue CMOS microprocessor; inductance effects; silicon-based IC design; sub-micron CMOS VLSI; CMOS integrated circuits; Inductance calculations; Integrated circuit design; Microprocessors; Silicon materials/devices; Very-large-scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
VLSI Circuits, 1993. Digest of Technical Papers. 1993 Symposium on
Conference_Location
Kyoto, Japan
Type
conf
DOI
10.1109/VLSIC.1993.920518
Filename
920518
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