Properties of DLC films deposited by the pulsed are ion source

The pulsed vacuum arc ion deposition is a new technology that is paid great attentions by the experts internal and external recently. It has many special advantages that are different from other deposition methods. Diamond-like carbon (DLC) films are new films that its hardness is high, its resistance ration is high, its fiction coefficient is small, and it tis transparent in the infrared range. In this paper, the principle of pulsed Vacuum arc ion source is introduced, DLC films are deposited by pulsed vacuum arc ion source, and the properties of DLC films deposited by pulsed vacuum arc ion source, including the deposition uniformity, films composition, films hardness, surface resistance, and infrared transmittance, are researched.