DocumentCode
3071977
Title
Minimizing Mobile Ion Damage during the Ash Process
Author
Shi, J. ; Rounds, S. ; Noble, T. ; DeSarno, M. ; Fink, S. ; Shaner, D. ; Stants, H.
Author_Institution
Fusion Semiconductor Systems
fYear
1996
fDate
13-14 May 1996
Firstpage
124
Lastpage
126
Keywords
Ash; Contamination; Fusion power generation; Plasma applications; Plasma devices; Plasma measurements; Plasma temperature; Probes; Radio frequency; Resists;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715218
Filename
715218
Link To Document