DocumentCode
3073200
Title
Heating rate of post-annealing on microstructure/electrical/optical properties of gallium and aluminum co-doped zinc oxide films
Author
Shang-Chou Chang ; To-Sing Li ; Che-Ning Yang ; Chen-Ming Wu ; Tien-Chai Lin
Author_Institution
Dept. of Electr. Eng., Kun Shan Univ., Tainan, Taiwan
fYear
2012
fDate
24-26 Oct. 2012
Firstpage
337
Lastpage
339
Abstract
To investigate whether heating rate of post-annealing can affect the microstructure, electrical and optical properties of gallium and aluminum co-doped zinc oxide (GAZO) films or not, GAZO films were post-annealed with 9°C/min and 30°C/min heating rate. The GAZO films post-annealed with 9°C/min heating rate appears smaller full width at half maxima of (002) diffraction peak, more uniform and bigger grain size, higher mobility, lower resistivity, higher average optical transmittance and higher figure of merit than those with 30°C/min heating rate. Low heating rate like 9°C/min in post-annealing can provide more time in thermal reaction for GAZO films at a certain heating temperature. This scenario may explain the above phenomena.
Keywords
aluminium; annealing; gallium; grain size; heating; semiconductor doping; semiconductor thin films; thermal conductivity; zinc compounds; GAZO films; ZnO; aluminum co-doped zinc oxide films; average optical transmittance; diffraction peak; electrical property; figure of merit; full width at half maxima; gallium co-doped zinc oxide films; grain size; heating rate; microstructure property; mobility; optical property; post-annealing; resistivity; thermal reaction; Microstructure; Optical diffraction; Optical films; Resistance heating; Zinc oxide; gallium and aluminum doped zinc oxide; heating rate;
fLanguage
English
Publisher
ieee
Conference_Titel
Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT), 2012 7th International
Conference_Location
Taipei
ISSN
2150-5934
Print_ISBN
978-1-4673-1635-4
Electronic_ISBN
2150-5934
Type
conf
DOI
10.1109/IMPACT.2012.6420240
Filename
6420240
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