• DocumentCode
    3073474
  • Title

    Fundamental Aspects of Plasma-induced Radiation Damage Of SiO2/Si - A Review -

  • Author

    Mizutani, Tatsumi

  • Author_Institution
    R&D Center, Hitachi Kasado Works
  • fYear
    1996
  • fDate
    13-14 May 1996
  • Firstpage
    157
  • Lastpage
    159
  • Keywords
    Capacitance-voltage characteristics; Channel bank filters; Dielectrics and electrical insulation; Electron beams; Ion beams; Kinetic energy; Particle beams; Plasma measurements; Plasma sources; Plasma temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1996 1st International Symposium on
  • Print_ISBN
    0-9651577-0-9
  • Type

    conf

  • DOI
    10.1109/PPID.1996.715227
  • Filename
    715227
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3073474