DocumentCode
3074543
Title
The Evaluation of Plasma Damage on N20 Oxide and Pure Oxide
Author
Yoon, Jaeseog ; Lee, Sangdon ; Kim, Bongryul
Author_Institution
Yonsei University
fYear
1996
fDate
13-14 May 1996
Firstpage
181
Lastpage
183
Keywords
Etching; Plasma applications; Plasma density; Plasma devices; Plasma materials processing; Plasma measurements; Plasma properties; Plasma temperature; Stress; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715233
Filename
715233
Link To Document