DocumentCode

3076413

Title

Quantitative Analysis of Etching Damage in the Highly-Selective Oxide Etching

Author

Yagi, Kiyomi ; Matsui, Miyako ; Uchida, Fujihiko ; Tokunaga, Takafumi

Author_Institution

Hitachi Ltd.

fYear

1996

fDate

13-14 May 1996

Firstpage

223

Lastpage

225

Keywords

Chemistry; Contact resistance; Crystallization; Dry etching; Helium; Leakage current; Semiconductor films; Spectroscopy; Substrates; Wet etching;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1996 1st International Symposium on

Print_ISBN

0-9651577-0-9

Type

conf

DOI

10.1109/PPID.1996.715243

Filename

715243