DocumentCode
3076734
Title
Sub-quarter Micron Poly-Si Etching With Positive Pulse Biasing Technique
Author
Kofuji, N. ; Tsujimoto, K. ; Mizutani, T.
Author_Institution
Hitachi Ltd.
fYear
1996
fDate
14-14 May 1996
Firstpage
234
Lastpage
236
Keywords
Electrons; Etching; Plasma applications; Plasma density; Plasma temperature; Power generation; Pulsed power supplies; Space vector pulse width modulation; Temperature control; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1996 1st International Symposium on
Conference_Location
Santa Clara, CA, USA
Print_ISBN
0-9651577-0-9
Type
conf
DOI
10.1109/PPID.1996.715246
Filename
715246
Link To Document