Title :
Tapering and size reduction of single-mode silicon waveguides by maskless RIE
Author :
Chandran, Saravanan ; Das, Biplab Kanti
Author_Institution :
Dept. of Electr. Eng., IIT Madras, Chennai, India
Abstract :
Two-step reactive ion etching process has been optimized to demonstrate small cross-section single-mode silicon waveguides. This technique has helped to reduce the insertion loss of compact integrated photonic devices in SOI platform up to 3 dB.
Keywords :
integrated optics; optical losses; optical waveguides; silicon-on-insulator; sputter etching; SOI platform; Si; compact integrated photonic devices; insertion loss; maskless RIE; size reduction; small cross-section single-mode silicon waveguides; tapering reduction; two-step reactive ion etching; Couplers; Optical losses; Optical waveguides; Periodic structures; Photonics; Silicon; Silicon on insulator technology; integrated optics; silicon photonics; silicon-on-insulator; waveguide; waveguide tapering;
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2012 17th
Conference_Location :
Busan
Print_ISBN :
978-1-4673-0976-9
Electronic_ISBN :
2166-8884
DOI :
10.1109/OECC.2012.6276776
