• DocumentCode
    3093441
  • Title

    Variability-aware optimization of nano-CMOS Active Pixel Sensors using design and analysis of Monte Carlo experiments

  • Author

    Ghai, Dhruva ; Mohanty, Saraju P. ; Kougianos, Elias

  • Author_Institution
    VLSI Design & CAD Lab., Univ. of North Texas, Denton, TX
  • fYear
    2009
  • fDate
    16-18 March 2009
  • Firstpage
    172
  • Lastpage
    178
  • Abstract
    We propose a novel design flow for mismatch and process variation aware optimization of nanoscale CMOS active pixel sensor (APS) arrays. As a case study, an 8 times 8 APS array is designed using the proposed methodology for 32 nm CMOS technology. Performance metrics such as power, output voltage swing, dynamic range (DR) and capture time (delay) have been measured. The baseline results show a power consumption of 16.32 muW, output voltage swing of 428 mV, dynamic range (DR) of 59.47 dB and a capture time of 5.65 mus. The baseline APS array is subjected to 5% "intra-pixel" mismatch and 10% "inter-pixel" process variation and the effect on power and output voltage swing has been observed. The APS array is subjected to a design and analysis of Monte Carlo experiments based optimization. Using this approach, we have been able to achieve 21% reduction in power (including leakage). To the best of our knowledge, this is the first ever nano-CMOS implementation of an APS array optimized to be mismatch and process variation tolerant.
  • Keywords
    CMOS image sensors; Monte Carlo methods; nanotechnology; optimisation; Monte Carlo method; capture time; nanoCMOS active pixel sensors; output voltage swing; power consumption; process variation tolerant; variability-aware optimization; CMOS process; CMOS technology; Delay effects; Design optimization; Dynamic range; Monte Carlo methods; Power measurement; Sensor arrays; Time measurement; Voltage; Active Pixel Sensor (APS); Design of experiments (DOE); Dynamic Power; Gate Oxide Leakage; Monte Carlo; Nanoscale CMOS; Optimization; Subthreshold Leakage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Quality of Electronic Design, 2009. ISQED 2009. Quality Electronic Design
  • Conference_Location
    San Jose, CA
  • Print_ISBN
    978-1-4244-2952-3
  • Electronic_ISBN
    978-1-4244-2953-0
  • Type

    conf

  • DOI
    10.1109/ISQED.2009.4810289
  • Filename
    4810289