DocumentCode
3093441
Title
Variability-aware optimization of nano-CMOS Active Pixel Sensors using design and analysis of Monte Carlo experiments
Author
Ghai, Dhruva ; Mohanty, Saraju P. ; Kougianos, Elias
Author_Institution
VLSI Design & CAD Lab., Univ. of North Texas, Denton, TX
fYear
2009
fDate
16-18 March 2009
Firstpage
172
Lastpage
178
Abstract
We propose a novel design flow for mismatch and process variation aware optimization of nanoscale CMOS active pixel sensor (APS) arrays. As a case study, an 8 times 8 APS array is designed using the proposed methodology for 32 nm CMOS technology. Performance metrics such as power, output voltage swing, dynamic range (DR) and capture time (delay) have been measured. The baseline results show a power consumption of 16.32 muW, output voltage swing of 428 mV, dynamic range (DR) of 59.47 dB and a capture time of 5.65 mus. The baseline APS array is subjected to 5% "intra-pixel" mismatch and 10% "inter-pixel" process variation and the effect on power and output voltage swing has been observed. The APS array is subjected to a design and analysis of Monte Carlo experiments based optimization. Using this approach, we have been able to achieve 21% reduction in power (including leakage). To the best of our knowledge, this is the first ever nano-CMOS implementation of an APS array optimized to be mismatch and process variation tolerant.
Keywords
CMOS image sensors; Monte Carlo methods; nanotechnology; optimisation; Monte Carlo method; capture time; nanoCMOS active pixel sensors; output voltage swing; power consumption; process variation tolerant; variability-aware optimization; CMOS process; CMOS technology; Delay effects; Design optimization; Dynamic range; Monte Carlo methods; Power measurement; Sensor arrays; Time measurement; Voltage; Active Pixel Sensor (APS); Design of experiments (DOE); Dynamic Power; Gate Oxide Leakage; Monte Carlo; Nanoscale CMOS; Optimization; Subthreshold Leakage;
fLanguage
English
Publisher
ieee
Conference_Titel
Quality of Electronic Design, 2009. ISQED 2009. Quality Electronic Design
Conference_Location
San Jose, CA
Print_ISBN
978-1-4244-2952-3
Electronic_ISBN
978-1-4244-2953-0
Type
conf
DOI
10.1109/ISQED.2009.4810289
Filename
4810289
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