DocumentCode :
3096135
Title :
Kinetics and radiative processes in Xe/I/sub 2/ inductively coupled RF discharges at low pressure
Author :
Barnes, Paul N. ; Verdeyen, J.T. ; Kushner, Mark J.
Author_Institution :
Dept. of Electr. & Comput. Eng., Illinois Univ., Urbana, IL, USA
fYear :
1996
fDate :
3-5 June 1996
Firstpage :
269
Abstract :
Summary form only given. The environmental concern over the presence of mercury in conventional fluorescent lamps has motivated research into alternative electrically efficient near UV plasma lighting sources. One such candidate is multi-wavelength UV emission from Xe/I/sub 2/ mixtures, including excimer radiation from XeI* at 253 nm. Previous studies of the XeI* system were performed at high pressures and were intended for laser applications. Practical Xe/I/sub 2/ lamps are likely to operate in the 0.5-10 Torr regime and use electrodeless excitation to avoid issues related to electrode erosion by the halogen. In this paper, we report on an experimental investigation of low pressure, inductively coupled plasmas sustained in Xe/I/sub 2/ mixtures. The goals of this work are to characterize the UV emission and determine excitation mechanisms in a parameter space of interest to lighting applications.
Keywords :
xenon; 0.5 to 10 torr; 253 nm; UV emission; Xe-I/sub 2/; Xe/I/sub 2/; electrodeless excitation; excimer radiation; excitation mechanisms; fluorescent lamps; inductively coupled RF discharge; kinetics; laser applications; lighting applications; low pressure discharges; multi-wavelength UV emission; near UV plasma lighting sources; radiative processes; Electromagnetic coupling; Electron optics; Fluorescent lamps; Kinetic theory; Laser excitation; Optical interferometry; Plasma applications; Radio frequency; Spectroscopy; Stimulated emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3322-5
Type :
conf
DOI :
10.1109/PLASMA.1996.551526
Filename :
551526
Link To Document :
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