• DocumentCode
    3099405
  • Title

    Parasitic bipolar transistor model using generated-hole-dependent base resistance

  • Author

    Suzuki, Kunihiro ; Anzai, Hiromi ; Nomura, Toshio ; Satoh, Shigeo

  • Author_Institution
    Fujitsu Labs. Ltd., Atsugi, Japan
  • fYear
    2001
  • fDate
    2001
  • Firstpage
    246
  • Lastpage
    252
  • Abstract
    An accurate parasitic bipolar transistor model is indispensable for the evaluation of ESD immunity. Injected electrons are well known to modulate base resistance, but we found that it is not true during snapback because the electric field associated with injected electrons is compensated by the holes generated in the drain region. We therefore developed a new base resistance model that depends on generated holes as well as injected electrons. Here we show that this model can account for the Gummel plot and the snapback characteristics simultaneously. Furthermore, we developed analytical modes for prominent features of snapback characteristics and clarified the dependence of snapback characteristics on various parameters
  • Keywords
    MOSFET; bipolar transistors; electrostatic discharge; equivalent circuits; integrated circuit reliability; protection; semiconductor device models; ESD immunity; Gummel plot; MOSFET; Si; analytical modes; base resistance model; base resistance modulation; drain region hole generation; electric field compensation; generated holes; generated-hole-dependent base resistance; injected electrons; parasitic bipolar transistor model; prominent snapback features; snapback; snapback characteristics; snapback characteristics parameter dependence; Bipolar transistors; Charge carrier processes; Circuit simulation; Electric resistance; Electrostatic discharge; Equivalent circuits; Immune system; MOSFET circuits; Protection; Robustness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International
  • Conference_Location
    Orlando, FL
  • Print_ISBN
    0-7803-6587-9
  • Type

    conf

  • DOI
    10.1109/RELPHY.2001.922909
  • Filename
    922909