DocumentCode
3099405
Title
Parasitic bipolar transistor model using generated-hole-dependent base resistance
Author
Suzuki, Kunihiro ; Anzai, Hiromi ; Nomura, Toshio ; Satoh, Shigeo
Author_Institution
Fujitsu Labs. Ltd., Atsugi, Japan
fYear
2001
fDate
2001
Firstpage
246
Lastpage
252
Abstract
An accurate parasitic bipolar transistor model is indispensable for the evaluation of ESD immunity. Injected electrons are well known to modulate base resistance, but we found that it is not true during snapback because the electric field associated with injected electrons is compensated by the holes generated in the drain region. We therefore developed a new base resistance model that depends on generated holes as well as injected electrons. Here we show that this model can account for the Gummel plot and the snapback characteristics simultaneously. Furthermore, we developed analytical modes for prominent features of snapback characteristics and clarified the dependence of snapback characteristics on various parameters
Keywords
MOSFET; bipolar transistors; electrostatic discharge; equivalent circuits; integrated circuit reliability; protection; semiconductor device models; ESD immunity; Gummel plot; MOSFET; Si; analytical modes; base resistance model; base resistance modulation; drain region hole generation; electric field compensation; generated holes; generated-hole-dependent base resistance; injected electrons; parasitic bipolar transistor model; prominent snapback features; snapback; snapback characteristics; snapback characteristics parameter dependence; Bipolar transistors; Charge carrier processes; Circuit simulation; Electric resistance; Electrostatic discharge; Equivalent circuits; Immune system; MOSFET circuits; Protection; Robustness;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium, 2001. Proceedings. 39th Annual. 2001 IEEE International
Conference_Location
Orlando, FL
Print_ISBN
0-7803-6587-9
Type
conf
DOI
10.1109/RELPHY.2001.922909
Filename
922909
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