Title :
Reduction Of Electron Shading Damage With Pulse-modulated ECR Plasma
Author :
Sakamori, Shigenori ; Maruyama, Takahiro ; Fujiwara, Nobuo ; Miyatake, Hiroshi ; Yoneda, Masahiro
Author_Institution :
Mitsubishi Electric Corporation
Keywords :
Capacitors; Channel bank filters; Electrodes; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Silicon; Substrates;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596689
