• DocumentCode
    310841
  • Title

    Reduction Of Electron Shading Damage With Pulse-modulated ECR Plasma

  • Author

    Sakamori, Shigenori ; Maruyama, Takahiro ; Fujiwara, Nobuo ; Miyatake, Hiroshi ; Yoneda, Masahiro

  • Author_Institution
    Mitsubishi Electric Corporation
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    55
  • Lastpage
    58
  • Keywords
    Capacitors; Channel bank filters; Electrodes; Electrons; Etching; Plasma applications; Plasma density; Plasma devices; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596689
  • Filename
    596689
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310841