Title :
Study Of Pattern Dependent Charging In A High-density, Inductively Coupled Metal Etcher
Author :
Patrick, Roger ; Jones, Phillip ; Lukaszek, Wes ; Shields, Jeffrey ; Birrell, Andrew
Author_Institution :
Lam Research Corporation
Keywords :
Argon; Electrons; Etching; Plasma applications; Plasma density; Plasma measurements; Plasma sheaths; Resists; Surface charging; Voltage;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596691
