• DocumentCode
    310862
  • Title

    Correlation Of Nitride Spacer Plasma Damage Results From Conventional Gate Capacitor Electrical Tests And A New, Non-contact Approach

  • Author

    Goss, Michael W. ; Findlay, Andrew

  • Author_Institution
    Digital Semiconductor
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    135
  • Lastpage
    138
  • Keywords
    Capacitors; Etching; Plasma applications; Plasma devices; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma stability; Pulse measurements; Testing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596719
  • Filename
    596719
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310862