• DocumentCode
    310883
  • Title

    A New Evaluation Technique Of Plasma-induced Si Substrate Damage By Photoreflectance Spectroscopy

  • Author

    Eriguchi, Koji ; Imai, Takaaki ; Asai, Akira ; Okuyama, Masanori

  • Author_Institution
    Matsushita Electric Ind. Co., Ltd.
  • fYear
    1997
  • fDate
    13-14 May 1997
  • Firstpage
    215
  • Lastpage
    218
  • Keywords
    Electric variables measurement; Etching; Optical surface waves; Plasma applications; Plasma materials processing; Plasma measurements; Plasma properties; Pollution measurement; Spectroscopy; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Plasma Process-Induced Damage, 1997., 2nd International Symposium on
  • Conference_Location
    Monterey, California, USA
  • Print_ISBN
    0-9651-5771-7
  • Type

    conf

  • DOI
    10.1109/PPID.1997.596749
  • Filename
    596749
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=310883