A Study Of The Influence Of Gas Chemistry On Notching In Metal Etching

Author

Tabara, Suguru ; Khayama, Y. ; Hatakeyama, Tadao ; Katsuragi, Ken ; Tanabe, Masafumi

Author_Institution

YAMAHA Corporation

fYear

1997

fDate

13-14 May 1997

Firstpage

233

Lastpage

236

Keywords

Capacitors; Chemistry; Etching; Gases; Helium; Plasma applications; Plasma devices; Plasma measurements; Resists; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Process-Induced Damage, 1997., 2nd International Symposium on

Conference_Location

Monterey, California, USA

Print_ISBN

0-9651-5771-7

Type

DOI

10.1109/PPID.1997.596757

Filename

596757

Link To Document