Title :
The Role Of Metal-1 Layout In Plasma Processing-induced Damage
Author :
El Hassan, Motasim G. ; Awadelkarim, Osama O. ; Werking, J.
Author_Institution :
The Pennsylvania State University
Keywords :
Annealing; Degradation; Etching; Laboratories; MOSFET circuits; Plasma applications; Plasma devices; Plasma materials processing; Testing; Very large scale integration;
Conference_Titel :
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location :
Monterey, California, USA
Print_ISBN :
0-9651-5771-7
DOI :
10.1109/PPID.1997.596763
