DocumentCode
310894
Title
The Role Of Metal-1 Layout In Plasma Processing-induced Damage
Author
El Hassan, Motasim G. ; Awadelkarim, Osama O. ; Werking, J.
Author_Institution
The Pennsylvania State University
fYear
1997
fDate
13-14 May 1997
Firstpage
251
Lastpage
254
Keywords
Annealing; Degradation; Etching; Laboratories; MOSFET circuits; Plasma applications; Plasma devices; Plasma materials processing; Testing; Very large scale integration;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Process-Induced Damage, 1997., 2nd International Symposium on
Conference_Location
Monterey, California, USA
Print_ISBN
0-9651-5771-7
Type
conf
DOI
10.1109/PPID.1997.596763
Filename
596763
Link To Document