Title :
Nissin 300 mm medium current ion implanter EXCEED2300
Author :
Nagai, Nobuo ; Tamura, Yoshio ; Yuasa, Satoru ; Iwasawa, Koji ; Matsumoto, Takao ; Nakaya, Makoto ; Nakamura, Mitsunori ; Nagayama, Tsutomu
Author_Institution :
Nissin Ion Equip. Co. Ltd., Kyoto, Japan
Abstract :
Nissin 300 mm medium current ion implanter EXCEED2300 has been developed. The machine succeeds a variety of properties from field-proven 200 mm machine EXCEED2000 A, which meet the challenging requirements from the latest mass-production fabs. It means that EXCEED2300 guarantees the lowest risk at the ULSI manufacturing with 300 mm substrates. Furthermore, latest improvements to achieve the productivity enhancement and expansion of application were employed. This paper shows overview of these well-experienced technologies and latest improvements
Keywords :
ULSI; integrated circuit manufacture; ion implantation; reviews; semiconductor doping; 300 mm; Nissin 300 mm medium current ion implanter EXCEED2300; ULSI manufacturing; mass-production fabs; overview; productivity enhancement; Calibration; Contamination; Implants; Magnetic field measurement; Particle beam measurements; Particle beams; Plasma measurements; Pollution measurement; Sampling methods; Substrates;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924176
