Title :
Characterization of the SDS(R) gas source adsorbent technology
Author :
Wang, Luping ; Gorsuch, Christine ; McManus, Jim ; Batty, Doug
Author_Institution :
ATMI Inc., Danbury, CT, USA
Abstract :
The SDS(R) gas source is an adsorption based technology. The properties of the adsorbent dictate the SDS(R) performance related to gas storage, delivery capacity, and gas purity. Therefore ensuring a consistent adsorbent is one of the most critical tasks in SDS(R) manufacturing. In this paper, the key characteristics of SDS(R) adsorbent and their impact on SDS(R) performance will be discussed. These characteristics include: (1) adsorbent physical properties; (2) adsorbent pore size distribution and surface area; (3) adsorption and desorption isotherms; (4) refill (i.e. adsorption/desorption) cycles; (5) adsorbent shelf life; (6) gas desorption rate; and (7) SDS(R) gas purity. In addition, the practical aspects of cylinder refill procedures and cylinder utilization efficiency will be discussed
Keywords :
adsorption; ion sources; semiconductor doping; SDS gas source adsorbent technology; adsorbent physical properties; adsorbent pore size distribution; adsorbent shelf life; adsorption isotherms; cylinder refill procedures; cylinder utilization efficiency; delivery capacity; desorption isotherms; gas desorption rate; gas purity; gas storage; refill; surface area; Ash; Gases; Ion implantation; Manufacturing processes; Pressure measurement; Product safety; Productivity; Stability criteria; Temperature; Trademarks;
Conference_Titel :
Ion Implantation Technology, 2000. Conference on
Conference_Location :
Alpbach
Print_ISBN :
0-7803-6462-7
DOI :
10.1109/.2000.924260
