Challenges of RF and mixed signal design under process variability

Author

Panagopoulos, Georgios ; Riess, Phillipp ; Baumgartner, Philip

Author_Institution

Intel Corp., Munich, Germany

fYear

2013

fDate

8-10 July 2013

Firstpage

251

Lastpage

251

Abstract

Summary form only given. The continuous device shrinking, towards nano-scaled technology nodes, has been resulted in yield and reliability challenges due to technology process variations for active FEOL devices and passives in the BEOL. These effects have been modelled extensively in terms of global and local variations. However, a lot of challenges remain to capture the medium range mismatch of these devices. This presentation will give some examples of RF and mixed signal circuits such as LNAs, PAs and VCOs where their performance is degraded due to this additional variability.

Keywords

integrated circuit design; low noise amplifiers; mixed analogue-digital integrated circuits; nanotechnology; power amplifiers; radiofrequency integrated circuits; voltage-controlled oscillators; BEOL; LNA; PA; RF signal circuits; VCO; active FEOL devices; continuous device shrinking; global variations; local variations; mixed signal circuits; nanoscaled technology nodes; passive devices; process variability; technology process variations; Integrated circuit modeling; Nanoscale devices; Performance evaluation; Radio frequency; Reliability engineering; Signal design;

fLanguage

English

Publisher

ieee

Conference_Titel

On-Line Testing Symposium (IOLTS), 2013 IEEE 19th International

Conference_Location

Chania

Type

conf

DOI

10.1109/IOLTS.2013.6604095

Filename

6604095