Title :
Performances of Si nanocrystal memories obtained by by CVD and their potentialities to further scaling of non-volatile memories
Author :
Gerardi, C. ; ESalvo, B.D. ; Lombardo, Salvatore ; Baron, T.
Author_Institution :
STMicroelectronics, Catania, Italy
Abstract :
We have fabricated nanocrystal memories both single cells and arrays by using low pressure chemical vapor deposition of silicon nanocrystals. The potentialities of nanocrystal memories are discussed both in terms of nanocrystal deposition and control dielectrics optimization. Excellent performances are achieved, showing that this technology shows potentialities for non volatile memory cell scaling. In addition we discuss the impact of the fluctuations in nanocrystals distribution on the scaling possibilities of these memories.
Keywords :
CMOS memory circuits; chemical vapour deposition; elemental semiconductors; flash memories; hot carriers; nanoelectronics; silicon; tunnelling; CMOS flash technology; CVD fabricated memories; Fowler-Nordheim tunnelling; NAND application; NOR application; Si; channel hot electron injection; control dielectrics optimization; low pressure chemical vapor deposition; memory performance; nanocrystal deposition; nanocrystal distribution fluctuations; nanocrystal memories; nonvolatile memories scaling; single cells; test arrays; Chemical vapor deposition; Dielectrics; Flash memory; Fluctuations; Nanocrystals; Nonvolatile memory; Process control; Scanning electron microscopy; Silicon; Threshold voltage;
Conference_Titel :
Integrated Circuit Design and Technology, 2004. ICICDT '04. International Conference on
Print_ISBN :
0-7803-8528-4
DOI :
10.1109/ICICDT.2004.1309902