A process control strategy based upon device performance metrics

Author

Ruegsegger, Steven ; Conchieri, Brian

Author_Institution

IBM Corp., Essex Junction, VT, USA

fYear

2001

fDate

2001

Firstpage

41

Lastpage

47

Abstract

An application has been developed with the intended purpose of reducing device performance variation. Its main goal is to provide visual and statistical guidance to the process matching activities across toolsets by showing the process owners how the process affects device metrics. Standard Shewhart, EWMA, and Student´s T statistical tests are performed on interacting device metrics and process operations. The user can view the test results in a simple red light/green light summary table on the web. The result at IBM Microelectronics has been a reduction in mean time to detect process and process equipment that are negatively impacting functional yield

Keywords

integrated circuit measurement; integrated circuit yield; moving average processes; statistical analysis; statistical process control; EWMA statistical tests; Shewhart statistical tests; Student´s T statistical tests; device metrics; device performance metrics; device performance variation; functional yield; interacting device metrics; mean detection time; process control strategy; process equipment; process matching activities; process operations; result summary table; statistical guidance; toolsets; visual guidance; Automatic control; Feedback; Manufacturing processes; Microelectronics; Performance evaluation; Process control; Rivers; Semiconductor device manufacture; Semiconductor device measurement; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Advanced Semiconductor Manufacturing Conference, 2001 IEEE/SEMI

Conference_Location

Munich

ISSN

1078-8743

Print_ISBN

0-7803-6555-0

Type

conf

DOI

10.1109/ASMC.2001.925613

Filename

925613